Research Progress

Joint Lab Established between SARI and Anji Microelectronics
date: 2015-02-10

Launching Ceremony of the Joint Lab established between SARI and Anji Microelectronics (Shanghai) Co., Ltd was held on February 9th, 2015. Prof. Jiang Biao, Vice President of SARI, Mr. Guan Jianguo, Director of Technology Transfer Center in SARI, Ms Wang Shumin, Chairwoman and CEO of Anji Microelectronics attended the ceremony. 

Prof. Jiang pointed out in his address that by integrating Anji Microelectronics’s first-class research team and SARI’s resourceful research platform, the two parties could realize mutual benefit and win-win partnership, and make due contribution to China’s semiconductor industry. 

The Joint Lab will focus on the research and industrialization of 1) integrated circuit chemical mechanical polishing slurry and related nano materials; 2) new generation of photoresist and the corresponding effluent recycling technology development; and 3) the preparation of high purity electronic materials and high purity electronic chemicals. 

 

Plate Unveiling Ceremony 

 

Group Photo